"Huh~"

After his mind calmed down for a while, Lin Xiao felt that his thinking had become clear again.

The increased brain development this time was less than one-tenth of the original level, and the burden on him was not great. He just felt a little dizzy. After waiting for a while, the dizziness gradually subsided.

At this moment, he looked up at the surrounding environment again, and felt that everything around him seemed to be under his control. He could even directly build the entire room into a 3D model, and then placed it in his brain.

And you can even make changes to this model directly.

In addition, he even feels that he can now easily perform prime factorization of eight-digit numbers.

At the same time, he felt that his understanding of physics seemed to be one step closer.

Originally, he got a [Physics Master Halo] from the system because he proposed a multi-dimensional field theory before. This halo has a very high bonus for him, which is why he has the confidence to use the lithography machine.

And now his physics has been upgraded to level 5, which gives him more confidence to shorten this time.

"Even...EUV lithography machines are not a problem. It seems that X-ray lithography machines can also work?"

This idea suddenly appeared in Lin Xiao's mind.

X-ray lithography machine refers to a lithography machine that uses X-rays as a light source.

The wavelength of X-ray is shorter than that of extreme ultraviolet light, making it easier to produce advanced process chips.

And this kind of photolithography machine has an advantage, that is, its light source is directly irradiated on the bottom of the chip.

This exposure method is called direct writing.

In the light source of the EUV lithography machine, the EUV light source undergoes various refractions of more than a dozen lenses, and finally forms a chip on the chip by projection through the pattern on the mask.

This means that the X-ray lithography machine can be used without a photomask. At the same time, it has very low requirements on the lens system. It only has some requirements on the smoothness of the lens surface.

In addition, after the EUV light source has been refracted by optical lenses more than ten times, the energy of the original light source will be greatly weakened. In the end, the energy of the original 100% may only be less than 3%. This is why EUV

The requirement for the light source is that the power is strong enough. Otherwise, it is impossible for China to achieve a breakthrough in the light source. After all, the method is known and it is impossible to create it.

The X-ray lithography machine is different. Because it is a direct writing type and does not need to be refracted by the lens, there is no need to worry about insufficient power of the light source. What you have to worry about is that the exposure time is slightly longer, which will affect the final effect.

.

Of course, X-rays have many advantages, but they also have disadvantages.

That is, compared with EUV lithography machines, lithography efficiency is relatively low, and it is more difficult to achieve mass production. This is why X-ray lithography machines have not become mainstream. Although they are still used today, they are not

So it arouses people's concern.

However, Lin Xiao naturally considered this problem, and he felt that the X-ray lithography machine could be used because of the inspiration he just had, which gave him a method to achieve mass production of X-ray lithography machines.

That is to use the diffraction effect.

X-rays can be diffracted through crystals, and generally speaking, crystal structures are basically determined using X-ray diffraction.

But on the other hand, if you choose a suitable crystal material as a lens, and then use the diffraction effect to achieve scaling of X-rays, you can achieve production efficiency like an EUV lithography machine. In addition, with the powerful energy of X-rays, you can achieve

Faster production efficiency and very easy.

Of course, there is a difficult question, which is what this suitable crystal is. In addition, using the diffraction effect to control X-rays requires a huge amount of data to be processed.

So until now, although this diffraction effect has been used to realize chip manufacturing, they are basically limited to some special patterns, and there are very few application cases.

For Lin Xiao, he just thought about it this way.

Although he is still a little sure now, if he tells the outside world that he wants to build an X-ray lithography machine, most of Huaxin Alliance will have to withdraw the next day.

Without thinking any more, he turned his attention back to the mathematical model in front of him.

Now that he had upgraded, he looked back at this model again, and suddenly felt that this model still seemed to be somewhat lacking?

"Hmm...it seems that this model can be further optimized."

After a moment of thinking, he found a point that could be optimized.

"Well, there is one more thing that can be optimized about the ion polisher calibration system."

The calibration system of the ion polisher is affected by its own accuracy. Of course, considering the influence of the internal magnetic field, the trajectory of the ion beam will be interfered by the magnetic field, just like the particle accelerator will also be affected by various interferences by the magnetic field.

Therefore, if the magnetic field interference error is corrected more accurately in the calibration system, or the difference between the magnetic field error and the ion polisher's own accuracy error is used, more accurate polishing can also be achieved.

Thinking of this, Lin Xiao immediately started to calculate, and this step is actually very easy, that is, the root search method.

Ion beam polishing machine, jet plasma, magnetic field error influence... these things add up, can't they be solved by root search method?

Of course, due to some different structures and functional differences, a simple modification to the root search method is also needed.

And this step is not difficult.

About half an hour later, he completed the optimization of the model.

After solving this problem, Lin Xiao's lips curled up.

"I'm so awesome."

After touching his face, Lin Xiao reached out and rubbed Mimi who was sleeping next to him, and asked with a smile: "Mimi, are you right?"

"Meow~"

Mimi's curled up body didn't move, she just barked, probably in response.

Lin Xiao smiled and masturbated again, then contacted Luo Gangxian and informed him of the news.

Naturally, I was very surprised. I didn't expect Lin Xiao to solve this problem so quickly.

After getting Lin Xiao's mathematical model, he was even more amazed. This mathematical model is full of various variables, but at a glance, it makes people feel the existence of mathematical beauty.

Soon, Luo Gangxian went over the mathematical model and immediately saw the key points of the model: "Professor Lin, is this model... a program?"

"Yes." Lin Xiao said: "Written it as a program and put it into the system of the ion polisher, it can effectively improve the accuracy of polishing."

"In addition, the most important thing is that it can replace human experience, which is equivalent to, even if we do not have top polishing masters like Zeiss, we can still polish top optical lenses!"

Hearing this, Luo Gangxian was even more shocked: "Can it replace the operator's experience? Mr. Lin, are you sure?"

Lin Xiao smiled: "I'm sure, you will know after you try it."

"Okay, I'll give it a try right away. Anyway, thank you."

"Nothing, this is exactly the purpose of my proposal to establish the Huaxin Alliance."

Lin Xiao said.

"Yes."

Luo Gangxian replied, feeling once again about Lin Xiao's spirit. Who else in the world has such ability and such ambition?

After hanging up the phone, Luo Gangxian stopped thinking about it. The best way to repay Lin Xiao now is to tell him that he succeeded.

Then, he immediately returned to the laboratory, summoned all relevant researchers, and held a meeting.

"Everyone, Professor Lin Xiao came over some time ago to visit our ultra-precision optical lens polishing technology. According to the agreement with Huaxin Alliance, he brought us an optimized plan. You can take a look now."

With that said, Luo Gangxian also showed the mathematical model to the people present.

The people present looked at this mathematical model and were astonished like Luo Gangxian. This was actually done by Lin Xiao within half a month. They looked at several mathematical formulas in this model, although they were not clear about these formulas yet.

What does it represent, but even at first glance, they feel confused.

"Okay, now let's start discussing this model."

After obtaining this mathematical model, they naturally need to conduct research and discussion to understand it.

If you can't understand it before using it, then they might as well go home and farm.

Then, they began to discuss every detail of the model.

The people present were all experts in this field and had done a lot of research on ion polishing. The more they interpreted this mathematical model, the more they could feel Lin Xiao's ability.

The more variables there are, the harder it is to integrate them. If they were to develop this model, I'm afraid it would be enough for them to organize several people, apply for a million-dollar grant, and study it for a year and a half.

In this way, after several days of discussion and communication with Lin Xiao, they finally clarified the model.

Then, this model was used to optimize their ion beam polishing system.

System optimization is a relatively long process, and they also need to constantly check the correctness of the program and identify bugs.

So this takes a long time. Of course, this time is not a problem at all compared to the time when success cannot be seen.

…

After finishing the lens polishing technology, Lin Xiao began research on the double workbench.

The dual workbench is a component that can increase the production efficiency of the photolithography machine. One workbench scans the silicon wafer, and the other workbench performs photolithography.

Huaguo has achieved an important breakthrough in dual worktable technology. It uses magnetic levitation micro-motion technology to achieve a precision of movement accuracy better than 2nm and improves the resolution of the dual worktable. It is considered to be the only one in the world except Aspen.

Maier is the second country to master the dual-stage technology of photolithography machines.

However, there are still many problems in the practical application of this technology. This breakthrough dual workbench cannot be directly used in EUV lithography machines.

Of course, there are problems in comparison, at least now they are tangible, so it is not difficult for Lin Xiao to optimize. However, in addition to optimization, the most critical thing is the upper limit of accuracy of the basic instruments.

Lin Xiao's optimization can only try to make the utilization of their instruments reach the upper limit, but it cannot raise the upper limit of the accuracy of these instruments. Raising the upper limit of the accuracy of the instruments can only improve the basic properties of the instrument.

It is equivalent to him being a top game master, operating a character with two divine costumes to fight a rookie with four divine costumes. He can defeat this rookie with his operation, but if the opponent is a rookie with six divine costumes, he can kill him with one strike.
To be continued...